以脈衝雷射沉積法成長n型氧化鋅薄膜之非熱合金化歐姆接觸特性研究
| Autor: | 蔡佳龍 |
|---|---|
| Rok vydání: | 2010 |
| Druh dokumentu: | 學位論文 ; thesis |
| Popis: | 98 We report on the formation of nonalloyed titanium （Ti） and nickel （Ni） ohmic contacts to n-type zinc oxide （ZnO） films grown by pulsed-laser deposition. The experimental results show a lower barrier height of the Ti/ZnO samples than that of the Ni/ZnO samples （due to the lower work function of Ti than Ni）, suggesting the Fermi-level unpinning at the interfaces. Based on the thermionic-emission or the thermionic-field-emission model, we found weak barrier-height dependence of the contact resistivity, implying that the presence of hydroxide in ZnO （i.e. the formation of the narrow depletion region at the metal/ZnO interface） resulted in the excess current component related to tunnelling, which led to the formation of the low-resistance nonalloyed metal/ZnO contact. The measurement temperature dependence of the contact resistivity revealed that the dominant current transport mechanism is field-emission. Keywords：Ohmic contact、ZnO、Pulsed-laser deposition、Work function、Thermionic-emission、Thermionic-field-emission、Field-emission |
| Databáze: | Networked Digital Library of Theses & Dissertations |
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