A study for the heat transfer on a rectangular substrate in a CVD process by using transient liquid crystal measurement technique
| Autor: | Hua-yun Guan, 關華雲 |
|---|---|
| Rok vydání: | 2008 |
| Druh dokumentu: | 學位論文 ; thesis |
| Popis: | 96 Chemical vapor deposition technology is often by using in the one of Wafer panel Foundry process, the heat transfer coefficient on the top substrate surface is the very important influence parameter in the manufacturing process. For this reason, the main object of this thesis is apply liquid crystals heat transfer measurement technique to set up a temperature measurement experiment system of transient thermochromatic liquid crystals and application simulating CVD process technique. Furthermore, an experimental is carried out in the present study to investigate the characteristics of heat transfer experiment study analysis resulting from a low speed air jet through the nozzle eccentric disc outlet impinging onto a rectangular acclivitous angles substrate confined in a vertical rectangular chamber. Finally, heat transfer coefficient empirical equations of the three relationship are proposed to Nusselt number correlate the effect of Reynolds number、Separation distances are Ratio of outlet and acclivitous substrate surface、Angles of rectangular acclivitous substrate. |
| Databáze: | Networked Digital Library of Theses & Dissertations |
| Externí odkaz: |
|