The modeling and controller design of radio frequency impedance matching network in PECVD equipment
| Autor: | Wen-Chih chiu, 邱文志 |
|---|---|
| Rok vydání: | 2006 |
| Druh dokumentu: | 學位論文 ; thesis |
| Popis: | 94 In semiconductor processing, the Radio Frequency (RF) power source is used to create plasma for wafer fabrication. Power transmission plays a very important role in wafer processing. Unstable power transmission will lead to unstable plasma, and wafer processing can not achieve it's goal. The impedance matching network behaves like a bridge for power transmission. It reduces the reflective power from the chamber, and increases the transmission power into the chamber, and provides a stable operating power. In this thesis, we use an impedance matching network in a plasma enhanced chemical vapor deposition (PECVD) equipment. First, we use neural network approach to establish the impedance model of the matching network, and the result will be compared with the traditional method to explain its elegance in dealing with stray impedance. Next, we analyze the relationship of input/output signals of RF sensor board in the matching network, and create mathematical model accordingly. Finally, we apply Neuro-Sliding mode control theory to control impedance matching network, and compare its result with the existing controller. The performance of new controller design will be discussed, and the importance of RF sensor signal processing to the control of impedance matching network will be high lighted in the conclusion portion of this research. |
| Databáze: | Networked Digital Library of Theses & Dissertations |
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