Novel Positive-working Aqueous Base Developable Photosensitive Polybenzoxazole for Microeletronic Applications
| Autor: | Mong-Chieh Wang, 王盟傑 |
|---|---|
| Rok vydání: | 2006 |
| Druh dokumentu: | 學位論文 ; thesis |
| Popis: | 94 Two novel series of positive working aqueous base developable photosensitive poly(benzoxazole) copolymer based on poly(hydroxyamide) copolymers (PHAcs), and 2,3,4-tris(1-oxo-2-diazonaphthoquinone-5- sulfonyloxy)-benzophenone(PIC-3) photosensitive compound were developed. The PHAcs were prepared by the condensation polymeriaztion of 2,2-Bis. 1,3-amino-4-hydroxy-phenyl hexafluoro-propane(BisAPAF), Isophthaloyl chloride(IC) and 1,3-Bis(4- butyryl chloride) tetra- methyldisiloxane(BBTD) in DMAc. PHAcs were successfully converted into PBOcs by thermal treatment. The structures of PHAcs and PBOcs were characterized by FT-IR, 1H-NMR and elemental analysis(EA). The Glass transition temperature and thermal stabilities of the PBOcs decreased as the content of BBTD increased, but can still be applied to microelectronics. Furthermore, the PBOc10 (BisAPAF-90%IC-10%BBTD) received a rating of 5B by a tape peeling test, after cooking in boiling water for 24 hr at 1 atm. The photosensitive PBO precursor containing 30 wt % PIC-3 showed a sensitivity of 223 mJ/cm2 and a contrast of 1.34 when it was exposed to broad-band light, and developed with a 0.6 wt% aqueous tetramethylammonium hydroxide(TMAH) solution at room temperature. A fine positive image featuring about 5μm line and space patterns was observed on the film of the photoresist exposed to 285 mJ/cm2 ultraviolet light at 436 nm(G-line) by the contact mode. |
| Databáze: | Networked Digital Library of Theses & Dissertations |
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