Characterization of Ru1-xIrxO2 Thin Films Prepared by Reactive Sputtering
| Autor: | Kuo-Hao Lee, 李國豪 |
|---|---|
| Rok vydání: | 2003 |
| Druh dokumentu: | 學位論文 ; thesis |
| Popis: | 91 Ru1-xIrxO2 thin films have been grown on Si(100) substrate by magnetron reactive sputtering method. A detailed characterization is carried out using X-ray photoelectron spectroscopy(XPS)、X-ray diffraction(XRD)、Raman spectroscopy、field-emission scanning electron microscopy(FESEM) and resistivity. XPS shows the Ru1-xIrxO2 with increasing iridium composition(x) from 0.1 to 0.7 by adjusting sputter power ratio of Ir to Ru targets. The analysis of chemical binding states also indicates the iridium metal residuals with the Ru1-xIrxO2 thin films. XRD reveals the rutile structure of our Ru1-xIrxO2 thin films. Raman spectra shows the microcrystalline quality in the films. Morphology change of sputtering Ru1-xIrxO2 thin films from densely packing columnar grains to loosely packing foliated-like are observed by FESEM. Resistivity measurement of thin films indicates the Ru1-xIrxO2 thin films composed of densely compact grains have better conduction characteristic. |
| Databáze: | Networked Digital Library of Theses & Dissertations |
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