Nanometer-Scale X-Ray Optical Diffraction Device
| Autor: | Wen Chien Chen, 陳文健 |
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| Rok vydání: | 2002 |
| Druh dokumentu: | 學位論文 ; thesis |
| Popis: | 90 The grating and zone plate of x-ray optics, were fabricated using scanning probe lithography (SPL) and e-beam direct writing respectively. We have demonstrated nanostructures of x-ray grating device with scanning probe lithography technique. Grating structures were generated by atomic force microscopy (AFM) with biased tip which transfer ultrathin Si3N4 which thickness is about 5nm into SiOx on (100) oriented Si wafer and then followed by dry etching. A zone plate has been fabricated by e-beam direct writing. The zone plate, a diameter of 200μm, consisted of an Au central stop and concentric rings of Ni. The thickness of Au layer was 200 nm, and thickness of Ni layers was 150 nm for the sake of focusing efficiency. The zone plate was designed for soft x-ray with wavelength of 1.77 nm. Currently the outermost zone width of 100 nm can be fabricated successfully. |
| Databáze: | Networked Digital Library of Theses & Dissertations |
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