Application of CFD in the Analysis of Air Flow Field in Clean Room Technology
| Autor: | Wei Chia Yen, 魏嘉言 |
|---|---|
| Rok vydání: | 2001 |
| Druh dokumentu: | 學位論文 ; thesis |
| Popis: | 89 The technology development in semiconductor devices has been a fast growing business recently. The final performance of a device depends on how effective air cleanliness control is done in a clean room. Because the particle’s size is so tiny that it’s motion and diffusion can be directly determined by the airflow distribution. Therefore, the means of circulating air to remove these pollutant particles effectively is the major issue in clean room design. The results from the present thesis provide detail airflow field distributions that are important for a clean room design. In the present thesis, we use the computational fluid dynamics code, CFX 4.2, to analyze airflow distributions in clean rooms. We build the model that is conformable to the size and environmental standard for a real clean room. Under steady state, we examine the effects of the inlet velocity, flow direction, inlet dimensions, machine platform shape, the quantity and location of heat flux. In the transient condition, we examine the effects of the inlet velocity and machine platform heat flux when they vary. From our simulated results, we noticed that when the inlet velocity is large, the vortex region is wide in the non-inlet area. The vortex is produced at the machine platform side with a sharp corner. If the heat flux is large, the vortex region and velocity are large on top of the machine platform. Because the steady airflow field can’t hold when inlet velocity changes, the particles diffuse outward from the vortex region at the machine platform side. These transient analyses were investigated with user-supplied subroutines and we have successfully demonstrated the consistencies between transient and steady state cases. |
| Databáze: | Networked Digital Library of Theses & Dissertations |
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