Study of magnetic properties of Fe-Pd ALLoy Multilayer Films
| Autor: | Hui Cheng Liu, 劉慧成 |
|---|---|
| Rok vydání: | 2001 |
| Druh dokumentu: | 學位論文 ; thesis |
| Popis: | 89 The magnetic and electronic propertion of Fe-Pd multilayers were investigated. The calculations were made with a structure mode where these multilayers grow in the (001) plane with a ABA stacking sequence of closed-packed planes. The resulting crystal structure has tetragonal symmetry with a ratio c/a=1.41. Experimental works on this new class of materials show that they present magnetic anisotropy, as first pointed out by N’eel. In this study, the variation of the perpendicular magnetic anisotropy effect on Fe-Pd multilayers were presented. From the result, we found that if films have been rapid annealed above 700℃, in the perpendicular direction, the correction, Hc, is 200Oe, but in plane, the correction is 20Oe on the substrate of SiO2/Si. 英文摘要………………………………………………………………..Ⅱ 目錄……………………………………………………………………..Ⅲ 圖目錄…………………………………………………………………..Ⅵ 表目錄…………………………………………………………………..Ⅸ 第一章 前言………………………………………………………. 1 1-1 簡介…………………………………………………………… 1 1-2 文獻回顧.…………………………………………………… .. 2 1-3 研究之構想及目的.……...……………………………………. 3 第二章 理論基礎…………………………………………………… 5 2-1 磁性理論.……………………………………………………… 5 2-1-1 磁性的起源…………………………………………………… 5 2-1-2 磁交互作用與磁異向性.……………………………………. 8 2-1-2.1 磁晶異向性….……………………………………………… 9 2-1-2.2 形狀異向性……………………………………………….. 11 2-1-3 磁硬化機構…………………………………………………. 13 2-1-3.1 反向磁區孕核及成長型機構…………………………….. 13 2-1-3.2 磁壁栓固型機構………………………………………….. 16 2-1-3.3 單磁區/微晶型機構………………………………………. 16 2-2 薄膜沈積理論………………………………………………… 17 2-2-1 濺鍍原理與電漿的形成……………………………………. 17 2-2-2 磁控濺鍍……………………………………………………. 21 2-2-3 離子束濺鍍…………………………………………………. 22 2-2-4 薄膜濺鍍率…………………………………………………. 25 2-2-5 薄膜沈積……………………………………………………. 25 第三章 實驗方法與儀器………………………………………….. 29 3-1 實驗流程………………………………………………………. 29 3-2 靶材製作………………………………………………………. 30 3-3 基板之製備…...……………………………………………….. 30 3-3-1 矽基板之裁製..….……………………………………………. 30 3-3-2 矽基板之清洗.….…………………………………………….. 30 3-4 薄膜濺鍍………………………………………………………. 31 3-5 熱處理……………………………………………………….… 35 3-5-1 快速熱處理…………………………………………………… 35 3-5-2 長時兼熱處理………………………………………………… 35 3-6 膜厚測定………………………………………………………. 35 3-6-1α-ste量測…………………………………………………….. 36 3-6-2掠角繞射量測…………………………………………………. 36 3-7成分與結構分析……………………………………………….. 37 3-7-1 X-Ray繞射分析…………………………………………………37 3-7-2電子顯微鏡分析……………………………………………… 39 3-7-3 EDS成分分析………………………………………………. 40 3-8磁性量測……………………………………………………….. 40 第四章 結果與討論………………………………………….……. 42 4-1 基本性質量測…………………..……………………….…… 42 4-1-1 薄膜厚度………………….…………………………….…… 42 4-1-2 Fe42 Å —Pd26 Å成分測定……..…………………….…………. 44 4-1-3 表面型態……………….……………………………………. 45 4-2 不同熱處理方式對結構之影響………………………………. 48 4-2-1 快速熱處離…………………………………………………… 48 4-2-2 恆溫熱處理…………..……………………………………… 53 4-3 表面結構………………………………………………………... 55 4-3-1快速熱處離…………………………………………………….. 55 4-3-2恆溫熱處理…………………………………………………. 59 4-4 不同熱處理方式對磁性之影響…………………………………...61 4-4-1快速熱處離對結構之影響……………………………………….61 4-4-2長時間熱處離對結構之影響……………………………………65 第五章 結論……………………………………………….………… 67 參考文獻…………………………………………………….………... 68 誌謝……………………………………………………………………..73 |
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