Breakdown Characteristics of Ultra Thin Oxides
Autor: | Chien-Yuan Lee, 李建源 |
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Rok vydání: | 2000 |
Druh dokumentu: | 學位論文 ; thesis |
Popis: | 88 The reliability of oxide films is an important issue for ultra large scale integrated (ULSI) IC''s, especially as oxide is getting thinner and thinner. It is known for several years that thinner oxides can have anomalous failure mode. However, despite the large research attention in recent years, the detailed mechanisms of the so-called soft breakdown (SBD) in ultra thin |
Databáze: | Networked Digital Library of Theses & Dissertations |
Externí odkaz: |