The Design and Fabrication of CMOS Micromachined RF Inductors
| Autor: | Hsin-Dar Lee, 李欣達 |
|---|---|
| Rok vydání: | 1999 |
| Druh dokumentu: | 學位論文 ; thesis |
| Popis: | 87 This thesis presents a new approach to design, fabricate, and optimize CMOS RF spiral inductors. We introduced a novel and completely new micromachining technology to improve the performance of inductor. And this maskless post-process micromachining technology is much simple, safe, low-cost, high-yield, CMOS-compatible than others. Measured results showed that the CMOS micromachining technology can improve the quality factor of silicon RF inductor over 100% at high frequency. We also demonstrated a fast and efficiency approach to design CMOS planar inductors with the best performance by computer simulations. And we got a lot of useful guidelines in the design of CMOS planar inductors. We verified these design guidelines by a lot of experiments in a commercial CMOS 0.35μm process. Furthermore, we established the useful inductor database for CMOS RF MMIC at the same time. The inductance values range from 2 to 12 nH. And the quality factors of some inductors exceed 10. These hard efforts made the dream of Single-chip CMOS RF system more and more feasible. |
| Databáze: | Networked Digital Library of Theses & Dissertations |
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