Simulation of Flow Pattern within a CVD Reactor
| Autor: | SHIEH JENG YUAN, 謝政原 |
|---|---|
| Rok vydání: | 1993 |
| Druh dokumentu: | 學位論文 ; thesis |
| Popis: | 81 A three-dimensional simulation program employing finite element method is established successfully to study the flow phenomenon within a horizontal Chemical Vapor Deposition (CVD) reactor. The flow system under consideration is non-isothermal, and Boussinesq approximation is adopted to incorporate the thermal effect. Three-dimensional vortices are discovered with the program, which is a breakthrough comparing with the conventional two-dimensional approach. The 3-D vortices can be further decomposed the transverse rolls and the longitudinal rolls. The critical parameter for the onset of the vortex is found to be (Gr/Re**k), which agrees well with the reports in the literature. The effect of various reactor wall temperature distributions on this vortex flow phenomenon is analysed. The influence of the tilted angle of the susceptor is studied also. All the results indicate that the simulation approach of this study is reliable and can be used extensively for the purpose of reactor design. |
| Databáze: | Networked Digital Library of Theses & Dissertations |
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