| Autor: |
Weerasinghe, Asanka Thushara |
| Jazyk: |
angličtina |
| Rok vydání: |
2012 |
| Předmět: |
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| Druh dokumentu: |
Text |
| Popis: |
Amplitude modulated atomic force microscopy-assisted electrostatic nanolithogaphy (AM-AFMEN) was used to pattern nanostructures in fluorinated graphene (FG) at the nansocale. Perforated fluorinated graphene is a two-dimensional sp3 carbon sheet in which each carbon atom is bonded to one fluorine atom by a covalent-ionic bond. This material was invented at Naval Research Laboratory in 2010 by Robinson et al using graphene on copper substrates exposed to XeF2 at 30C. To achieve a theoretical understanding of nanolithography in Fluorographene the nanopatterning process has been modeled as a standard electromagnetism problem. A numerical approach based on a relaxation method has been developed to solve the problem and calculate the surface electric field distribution and the pressure distribution. Our results suggest that the tip-surface separation has a significant influence on such distributions and the pressure to break a sheet of Fluorographene is distinctly smaller than the elastic modulus (0.3 TPa).Our experiments with the AM-AFMEN technique show that the size of the ablated areas in fluorinated graphene has an approximate quadratic relationship with the bias voltage. Our results also suggest that localized heating may alter the breaking strength of the material. Furthermore de-fluorination of graphene results in a substantial drop of the resistance of nanostructures in Fluorographene. |
| Databáze: |
Networked Digital Library of Theses & Dissertations |
| Externí odkaz: |
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