Localized resist heating due to electron-beam patterning during photomask fabrication

Autor:	Wei, Alexander C.
Jazyk:	angličtina
Rok vydání:	2001
Popis:	Thesis (M.S.)--University of Wisconsin--Madison, 2001. Typescript. eContent provider-neutral record in process. Description based on print version record. Includes bibliographical references (leaves 59-61).
Databáze:	Networked Digital Library of Theses & Dissertations
Externí odkaz:	http://catalog.hathitrust.org/api/volumes/oclc/50083538.html Zobrazit plný text záznamu