Computer aided mask layout synthesis for anisotrophic etch photolithography
| Autor: | Long, Mark K. |
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| Jazyk: | angličtina |
| Rok vydání: | 1999 |
| Zdroj: | Computer aided mask layout synthesis for anisotrophic etch photolithography [electronic thesis] |
| Druh dokumentu: | Electronic dissertations. |
| Popis: | Thesis (Ph. D.). UM #9932850. Includes bibliographical references. |
| Databáze: | Networked Digital Library of Theses & Dissertations |
| Externí odkaz: |
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