Growth and Characterization of Thin MoS2 Layers by CVD

Autor:	Nordheim, Gregor
Jazyk:	angličtina
Rok vydání:	2015
Předmět:	Chemical Vapor Deposition Thin Film Molybdenum Disulfide Silicon Carbide Intercalation info:eu-repo/classification/ddc/546.683 ddc:546.683 info:eu-repo/classification/ddc/620.1 ddc:620.1 CVD-Verfahren Dünne Schicht Molybdändisulfid Siliciumcarbid Interkalation
Druh dokumentu:	Text<br />Conference Material
DOI:	10.1002/admi.202300725
Popis:	The contribution describes the construction of a CVD system, the deposition of thin molybdenum disulphide layers using this system and the analysis of the samples produced. The deposition of thin molybdenum disulphide layers and an intercalation of the silicon carbide substrate used were demonstrated and the measurement results obtained by atomic force microscopy and photoelectron spectroscopy were further discussed.
Databáze:	Networked Digital Library of Theses & Dissertations
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