Reduced Order Modeling and Control of Thin Film Growth in an HPCVD Reactor

Autor:	Banks, H. T., Beeler, S. C., Kepler, G. M., Tran, H. T.
Zdroj:	SIAM Journal on Applied Mathematics, 2002 Apr 01. 62(4), 1251-1280.
Databáze:	JSTOR Journals
Externí odkaz:	https://www.jstor.org/stable/3061721 Zobrazit plný text záznamu