NOVEL: A NONLINEAR VISCOELASTIC MODEL FOR THERMAL OXIDATION OF SILICON

Autor:	Peng, J.P., Chidambarrao, D., Srinivasan, G.R.
Zdroj:	COMPEL -The international journal for computation and mathematics in electrical and electronic engineering, 1991, Vol. 10, Issue 4, pp. 341-353.
Databáze:	Emerald Insight
Externí odkaz:	http://www.emeraldinsight.com/doi/10.1108/eb051711 Zobrazit plný text záznamu