Preventing unwanted atomic layer deposition by liquid sealing

Autor: Wang, Haochuan, Yi, Zhibin, Li, Chun, Xia, Rui, Shao, Yan, Zhan, Shaohu, Feng, Wenshuai, Wen, Rui-Tao, Cheng, Xing, Luo, Guangfu, Yu, Yanhao
Zdroj: In Nano Trends September 2024 7
Databáze: ScienceDirect