Suppression of crack formation in wafer-scale amorphous SiNx films by residual hydrogen-ligands manipulation
| Autor: | Dong, Yutao, Yin, Xin, Liu, Wenjian, Shaikh, Fayaz A., Zhang, Ziyi, Wang, Xudong |
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| Zdroj: | In Nano Trends September 2024 7 |
| Databáze: | ScienceDirect |
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