Discovering deposition process regimes: Leveraging unsupervised learning for process insights, surrogate modeling, and sensitivity analysis

Autor: Loachamín-Suntaxi, Geremy, Papavasileiou, Paris, Koronaki, Eleni D., Giovanis, Dimitrios G., Gakis, Georgios, Aviziotis, Ioannis G., Kathrein, Martin, Pozzetti, Gabriele, Czettl, Christoph, Bordas, Stéphane P.A., Boudouvis, Andreas G.
Zdroj: In Chemical Engineering Journal Advances 15 November 2024 20
Databáze: ScienceDirect