Boron activation in silicon thin films grown by PECVD under epitaxial and microcrystalline conditions
| Autor: | Olivares, Antonio J. a, Zamchiy, A. a, b, Nguyen, V.S. c, Roca i Cabarrocas, P. a, c, ⁎ |
|---|---|
| Zdroj: | In Applied Surface Science Advances December 2023 18 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|