Nonvolatile memory characteristics associated with oxygen ion exchange in thin-film transistors with indium-zinc oxide channel and HfO2-x gate oxide

Autor: Han, Jimin, Jeong, Boyoung, Kim, Yuri, Suh, Joonki, Jeong, Hongsik, Kim, Hyun-Mi, Yoon, Tae-Sik
Zdroj: In Materials Today Advances August 2022 15
Databáze: ScienceDirect