Development of EUV interference lithography for 25 nm line/space patterns
| Autor: | Sahoo, A.K., Chen, P.-H., Lin, C.-H., Liu, R.-S., Lin, B.-J., Kao, T.-S., Chiu, P.-W., Huang, T.-P., Lai, W.-Y., Wang, J., Lee, Y.-Y., Kuan, C.-K. |
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| Zdroj: | In Micro and Nano Engineering September 2023 20 |
| Databáze: | ScienceDirect |
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