Robust sub-100 nm T-Gate fabrication process using multi-step development
| Autor: | Karami, Kaivan, Dhongde, Aniket, Cheng, Huihua, Reynolds, Paul M., Reddy, Bojja Aditya, Ritter, Daniel, Li, Chong, Wasige, Edward, Thoms, Stephen |
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| Zdroj: | In Micro and Nano Engineering June 2023 19 |
| Databáze: | ScienceDirect |
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