Water-soluble bio-sourced resists for DUV lithography in a 200/300 mm pilot line environment
| Autor: | Servin, Isabelle, Teolis, Alexandre, Bazin, Arnaud, Durin, Paule, Sysova, Olha, Gablin, Corinne, Saudet, Benoît, Leonard, Didier, Soppera, Olivier, Leclercq, Jean-Louis, Chevolot, Yann, Tiron, Raluca, Delair, Thierry, Trombotto, Stéphane |
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| Zdroj: | In Micro and Nano Engineering June 2023 19 |
| Databáze: | ScienceDirect |
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