Low-temperature ALD process development of 200 mm wafer-scale MoS2 for gas sensing application
| Autor: | Neubieser, R.-M., Wree, J.-L., Jagosz, J., Becher, M., Ostendorf, A., Devi, A., Bock, C., Michel, M., Grabmaier, A. |
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| Zdroj: | In Micro and Nano Engineering June 2022 15 |
| Databáze: | ScienceDirect |
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