New insights into CoFe/n-Si interfacial structure as probed by X-ray photoelectron spectroscopy
Autor: | Kumar, Arvind, Shripathi, T., Srivastava, P.C. |
---|---|
Zdroj: | In Journal of Science: Advanced Materials and Devices September 2016 1(3):290-294 |
Databáze: | ScienceDirect |
Externí odkaz: |