Atomic layer deposition mechanism of hafnium dioxide using hafnium precursor with amino ligands and water
| Autor: | Li, Jing, Guo, Jiayi, Zhou, Zhongchao, Xu, Rui, Xu, Lina, Ding, Yihong, Xiao, Hongping, Li, Xinhua, Li, Aidong, Fang, Guoyong |
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| Zdroj: | In Surfaces and Interfaces January 2024 44 |
| Databáze: | ScienceDirect |
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