Tantalum-doped tin oxide thin films using hollow cathode gas flow sputtering technology
| Autor: | Huo, Fangfang, Muydinov, Ruslan, Seibertz, Bertwin Bilgrim Otto, Wang, Can, Hartig, Manuel, Alktash, Nivin, Gao, Peng, Szyszka, Bernd |
|---|---|
| Zdroj: | In Heliyon 30 May 2024 10(10) |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|