Spatially selective crystallization of ferroelectric Hf0.5Zr0.5O2 films induced by sub-nanosecond laser annealing

Autor: Frechilla, Alejandro, Napari, Mari, Strkalj, Nives, Barriuso, Eduardo, Niang, Kham, Hellenbrand, Markus, Strichovanec, Pavel, Simanjuntak, Firman Mangasa, Antorrena, Guillermo, Flewitt, Andrew, Magén, César, de la Fuente, Germán F., MacManus-Driscoll, Judith L., Angurel, Luis Alberto, Pardo, José Ángel
Zdroj: In Applied Materials Today February 2024 36
Databáze: ScienceDirect
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