High resolution spin-on electron beam lithography resist with exceptional dry etching resistance
| Autor: | Grenci, G., Zanchetta, E., Pozzato, A., Della Giustina, G., Brusatin, G., Tormen, M. |
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| Zdroj: | In Applied Materials Today November 2015 1(1):13-19 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect