Freestanding ferroelectric thin film with robust ferroelectricity via inserted dielectric layers
| Autor: | Dai, Liyufen a, b, 1, Yao, Dijie b, c, 1, An, Feng b, Cheng, Mingqiang b, Zhong, Xiangli a, ⁎, Tang, Zhenhua c, ⁎, Zhong, Gaokuo b, ⁎ |
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| Zdroj: | In Materials Today Communications January 2025 42 |
| Databáze: | ScienceDirect |
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