Effect of substrate rotation on the growth behavior and topography of the [formula omitted] film deposited over a large area using DC magnetron sputtering with a rectangular target: Simulation approach and experiment
| Autor: | Ayachi Omar, Ali, Ayachi Amar, Chaima, Kashapov, Nail Faikovich, Ayachi Amor, Asma, Ayachi Amar, Abdelouahed, Ladjel, Segni, Luchkin, Alexander Grigoryvich, Ayachi Amar, Fatma Zohra, Al-Otoom, Awni Y, Mokrani, Omar Ben ElKhettab |
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| Zdroj: | In Materials Today Communications December 2024 41 |
| Databáze: | ScienceDirect |
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