First-principles investigation of Cu/Ti-TM/Si (TM=W, Ru) interfaces: Role of Ti-TM binary alloys as diffusion barrier layers
Autor: | Feng, Hai-Di, Xu, Yan-Ting, Zhao, Qi, Wen, Ming, Zhao, Zong-Yan |
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Zdroj: | In Materials Today Communications June 2024 39 |
Databáze: | ScienceDirect |
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