Competitive adsorption mechanism of SiHCl3 with BCl3 under a hydrogen atmosphere: Boron impurities introduction into polysilicon
| Autor: | Yuan, Xingping, Zhao, Dan, Ma, Wenhui, Zhang, Qi, Guo, Lijie, Lv, Qinghui, Yang, Ni, Hou, Yanqing, Xie, Gang |
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| Zdroj: | In Materials Today Communications June 2024 39 |
| Databáze: | ScienceDirect |
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