Influence of magnetron sputtering process on the stability of WO3 thin film gas sensor

Autor: Zhu, Chaoqi, Lv, Tao, Yang, Huimin, Li, Xiang, Wang, Xiaoxia, Guo, Xiang, Xie, Changsheng, Zeng, Dawen
Zdroj: In Materials Today Communications March 2023 34
Databáze: ScienceDirect