Inhibition of interlayer diffusion and reduction of impurities in thin metal films by ion irradiation

Autor: Kruhlov, I.O., Orlov, A.K., Dubikovskyi, O., Iguchi, Y., Erdélyi, Z., Sidorenko, S.I., Ishikawa, T., Prikhodko, S.V., Voloshko, S.M.
Zdroj: In Materials Today Communications November 2022
Databáze: ScienceDirect