Effect of V concentration in TiSiN monolayer coating on chip formation mechanism and chip sliding velocity during dry turning of Ti–6Al–4V alloy

Autor: Kumar, Ch Sateesh, Urbikain, Gorka, De Lucio, Pablo Fernández, Pérez-Salinas, Cristian, De Lacalle, Luis Norberto López, Fernandes, Filipe
Zdroj: In Journal of Materials Research and Technology September-October 2024 32:4456-4464
Databáze: ScienceDirect