Plasma power effect on crystallinity and density of AlN films deposited by plasma enhanced atomic layer deposition

Autor: Zhang, Xiao-Ying, Peng, Duan-Chen, Yan, Jia-Hao, Zhang, Zhi-Xuan, Ruan, Yu-Jiao, Zuo, Juan, Xie, An, Wu, Wan-Yu, Wuu, Dong-Sing, Huang, Chien-Jung, Lai, Feng-Min, Lien, Shui-Yang, Zhu, Wen-Zhang
Zdroj: In Journal of Materials Research and Technology November-December 2023 27:4213-4223
Databáze: ScienceDirect