Influence of O2 flow rate on the characteristics of TiO2 thin films deposited by RF reactive sputtering
| Autor: | Kamble, Sudhir S., Radhakrishnan, J.K. |
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| Zdroj: | In Materials Today: Proceedings 2021 45 Part 4:3915-3919 |
| Databáze: | ScienceDirect |
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