Studies of SiO2 thin films implanted with 100keV silicon ions
| Autor: | Vishwakarma, Suraj B., Dubey, Sheshmani K., Dubey, R.L., Bambole, V., Sulania, I., Kanjilal, D. |
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| Zdroj: | In Materials Today: Proceedings 2020 23 Part 2:345-351 |
| Databáze: | ScienceDirect |
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