High-spatial Resolution Figuring by Pulse Width Modulation Controlled Plasma Chemical Vaporization Machining

Autor: Yamamura, Kazuya, Takeda, Yoshiki, Sakaiya, Shogo, Funato, Daisuke, Endo, Katsuyoshi
Zdroj: In Procedia CIRP 2016 42:508-511
Databáze: ScienceDirect