Active Machine Learning for Chemical Engineers: A Bright Future Lies Ahead!

Autor: Ureel, Yannick, Dobbelaere, Maarten R., Ouyang, Yi, De Ras, Kevin, Sabbe, Maarten K., Marin, Guy B., Van Geem, Kevin M.
Zdroj: In Engineering August 2023 27:23-30
Databáze: ScienceDirect