Active Machine Learning for Chemical Engineers: A Bright Future Lies Ahead!
Autor: | Ureel, Yannick, Dobbelaere, Maarten R., Ouyang, Yi, De Ras, Kevin, Sabbe, Maarten K., Marin, Guy B., Van Geem, Kevin M. |
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Zdroj: | In Engineering August 2023 27:23-30 |
Databáze: | ScienceDirect |
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