Silicon Surface Passivation by Mixed Aluminum Precursors in Al2O3 Atomic Layer Deposition
Autor: | Bao, Yameng, Huang, Haibing, Zhu, Zhen, Lv, Jun, Savin, Hele |
---|---|
Zdroj: | In Energy Procedia August 2016 92:304-308 |
Databáze: | ScienceDirect |
Externí odkaz: |