Passivation Properties of Subnanometer Thin Interfacial Silicon Oxide Films
| Autor: | Lu, Wenjia, Leendertz, Caspar, Korte, Lars, Töfflinger, Jan Amaru, Angermann, Heike |
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| Zdroj: | In Energy Procedia 2014 55:805-812 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Lu, Wenjia, Leendertz, Caspar, Korte, Lars, Töfflinger, Jan Amaru, Angermann, Heike |
|---|---|
| Zdroj: | In Energy Procedia 2014 55:805-812 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|