Passivation of Si Wafers by ALD-Al2O3 Films with Different Surface Conditioning
Autor: | Lüder, Thomas, Hahn, Giso, Terheiden, Barbara |
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Zdroj: | In Energy Procedia 2011 8:660-665 |
Databáze: | ScienceDirect |
Externí odkaz: |
Autor: | Lüder, Thomas, Hahn, Giso, Terheiden, Barbara |
---|---|
Zdroj: | In Energy Procedia 2011 8:660-665 |
Databáze: | ScienceDirect |
Externí odkaz: |