Dipole formation and electrical properties of high-k/SiO2 interface according to the density of SiO2 interfacial layer
| Autor: | Yun, Hye Won, Lee, Jinho, Kim, Ryun Na, Ji, Seung Hwan, Ryu, Sang Ouk, Kim, Woo-Byoung |
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| Zdroj: | In Current Applied Physics May 2022 37:45-51 |
| Databáze: | ScienceDirect |
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