Ultraprecision CMP for sapphire, GaN, and SiC for advanced optoelectronics materials

Autor: Aida, Hideo, Doi, Toshiro, Takeda, Hidetoshi, Katakura, Haruji, Kim, Seong-Woo, Koyama, Koji, Yamazaki, Tsutomu, Uneda, Michio
Zdroj: In Current Applied Physics September 2012 12 Supplement 2:S41-S46
Databáze: ScienceDirect