Properties of a-C:H films deposited from a methane electron cyclotron wave resonant plasma

Autor: Morrison, N.A., William, C., Racine, B., Milne, W.I., Martinez, E., Esteve, J., Andujar, J.L.
Zdroj: In Current Applied Physics 2003 3(5):433-437
Databáze: ScienceDirect